Category | OEM | Model | Tool/Description | |
Assembly | Accent | Q7 |
| |
Assembly | ADE | 6034 | Wafer Measurement | |
Assembly | ADE | 9350 | Wafer Test System, 200mm Wafers | |
Assembly | ADE | 3046A | Wafer Thickness, Taper & Bow Tester | |
Assembly | ADE | 7900 Ultra Gage | Multifunction Dimensional Measurements for 500nm design rule | |
Assembly | ADE | 8100-14 | Wafer Tester with Wafer Shape, High Resistivity and Type Testing | |
Assembly | ADE | ADE 9700 |
| |
Assembly | ADE | EpiScan 1000 | High-speed film thickness measurement and mapping tool | |
Assembly | ADE | Ultra Gage 9500 |
| |
Assembly | ADE 9500 Ultragage | Ultragage 9500 |
| |
Assembly | ADEC | ADE 9500 |
| |
Assembly | ADEC | BT1152-240 | ADEC 1152 Board Tester | |
Assembly | ADE-DMS | 780 MRT | Digital Measurement System | |
Assembly | Advantest | M6761A | Retho Test ATE | |
Assembly | Advantest | M6761AD | Retho Test ATE | |
Assembly | Advantest | T3324 | Memory Tester | |
Assembly | Advantest | T5363P | Memory Tester | |
Assembly | Advantest | T5363P | Memory Tester | |
Assembly | Advantest | T5365P | Memory Test in Device | |
Assembly | Advantest | T5365P | Memory Test in Device | |
Assembly | Advantest | T5365P | Memory Test in Device | |
Assembly | Advantest | T5382A | Memory Tester (Dual head with MRAA) | |
Assembly | Advantest | T5382A | Memory Tester (Single head#1) | |
Assembly | Advantest | T666AF | ESD Tester | |
Assembly | Advantest | T6673 | Digital Test Systems in Device | |
Assembly | Advantest | TR1000T |
| |
Assembly | Advantest | T5382A | Memory Tester (Single head#2) | |
Assembly | Advantest | T5382A | Memory Tester (Dual head) | |
Assembly | Advantest | T5581P | Memory Tester (Single head) | |
Assembly | Aehr | MTX 3000 H/A |
| |
Assembly | AERONCA | WIS-100 | Wafer Surface Inspection System | |
Assembly | AERONCA | WIS-900 | Wafer Surface Inspection System, 2ea Available | |
Assembly | AG ASSOCIATES | 2106 | Rapid Thermal Processing System, for 100mm-150mm Wafers | |
Assembly | AG ASSOCIATES | 2146 | Rapid Thermal Processing System, Parts Tool Only | |
Assembly | AG Associates | 610 Heatpulse | RTA Rapid Thermal Annealing | |
Assembly | AG Associates | 4100 Heatpulse | RTA Rapid Thermal Annealing | |
Assembly | AG Associates | Heatpulse 410 | RTA Rapid Thermal Annealing | |
Assembly | AGIDENT | 16442A | Parameter Analyzer Tool | |
Assembly | Agilent | 1100 |
| |
Assembly | Agilent Technologies | V4400 |
| |
Assembly | Agilent Technologies | V4400 |
| |
Assembly | Air Liquide | See Listing | Gas VMBs | |
Assembly | Aixacct | TF Analyzer 2000 |
| |
Assembly | Aixtron | AIX200 | LP-MOCVD Chemical Vapor Deposition | |
Assembly | AKRION | V2-HL.2000 | Hybrid-Linear Automatic Acid Wet Station with Robotic Transfer (New), for Dual 150mm Cassettes | |
Assembly | AKRION | V2-SA.3200 | Semi-Automatic Acid Wet Station w/Robotic Transfer, 7 Tanks for Dual 150mm Cassettes | |
Assembly | AKRION | V2-SA.3200 | Semi-Automatic S/S Solvent Wet Station (New) | |
Assembly | Alcatel | 2441C | RF Sputter UP system | |
Assembly | ALESSI | REL-4500 | Analytical Manual Wafer Prober - Parts Tool Only | |
Assembly | Alpha Innotech | FA-1000 | Photo Emission Microscopy System | |
Assembly | Alphasem | SL9002-MM | Flip Chip bonder | |
Assembly | ALPHASEM | Swissline 9006 | Automatic Epoxy Die Bonder, 2ea Available | |
Assembly | AMAT | 8" Susceptor | Calibration Leveling tool | |
Assembly | AMAT | AME8330 |
| |
Assembly | AMAT | AME8330 |
| |
Assembly | AMAT | Centura 5200 CVD | 1999, SACVD | |
Assembly | AMAT | Centura 5200 RTP | 200mm | |
Assembly | AMAT | Centura 5200 RTP | 200mm | |
Assembly | AMAT | Centura 5200 RTP | 2000, 200mm | |
Assembly | AMAT | Centura 5300 | 200mm | |
Assembly | AMAT | Centura DPS+ | 1999, 200mm | |
Assembly | AMAT | Centura eMAX | Oxide Etch | |
Assembly | AMAT | CENTURA II DPS+ | 2002, 200mm | |
Assembly | AMAT | Centura II Super E | 2000, Oxide Etch | |
Assembly | AMAT | Centura II Super E | 2000, Oxide Etch | |
Assembly | AMAT | Centura MXP | Poly Etch | |
Assembly | AMAT | E-Max Chamber Assy | 200mm | |
Assembly | AMAT | E-Max Chamber Assy | 200mm | |
Assembly | AMAT | E-Max Chamber Assy | 200mm | |
Assembly | AMAT | P5000 | MxP+ Etch | |
Assembly | AMAT | P5000 | TEOS | |
Assembly | AMAT | P-5000 | Poly Etch | |
Assembly | AMAT | P-5000 | TiN CVD | |
Assembly | AMAT | P-5000 | CVD | |
Assembly | AMAT | P-5000 | 1995.10, 200mm | |
Assembly | AMAT | P-5000 | 1994, 200mm | |
Assembly | AMAT | P5000 ETCH | 200mm | |
Assembly | AMAT | P5000 ETCH | 200mm | |
Assembly | AMAT | P5000 ETCH | 200mm | |
Assembly | AMAT | P5000 MK-II | TEOS CVD | |
Assembly | AMAT | P5000C | SIN CVD | |
Assembly and Test | AMAT | P5000Wxz | W-CVD | |
Assembly and Test | AMAT | PE8330 | METAL Etch | |
Category | AMAT | PE8330 | METAL Etch | |
Clean | AMAT | PE8330 | METAL Etch | |
CMP | AMAT | PI9500 | High Current Implanter | |
CMP | AMAT | PI9500 | High Current Implanter | |
CMP | AMAT | PI9500 | High Current Implanter | |
CMP | AMEL Instruments | Instruments Model 2049 |
| |
CMP | AMEL Instruments | Instruments Model 2053 |
| |
CMP | Amtech/Tempress |
| Amtech/Tempress Atmoscan System (New in crate) | |
CMP | Anatech Hummer | 6.2 |
| |
CMP | Anelva | I-1060 SVII Plus-1 | Co-Sputter | |
CMP | Anelva | I-1060SV II | Alminium Sputter | |
CMP | Anelva | ILC-1060SV | Sputter | |
CMP | APEX | F636A-01 (Cruise 2000) | MOCVD LCSVD | |
CMP | Applied Material Orbot WF736 |
| Tester | |
CMP | Applied Materials | 5300 | Etcher | |
CMP | APPLIED MATERIALS | 8330 | Hexode Plasma Etchers for 125mm Wafers | |
CMP | Applied Materials | 8330 | Metal Etcher | |
CMP | Applied Materials | 9200 |
| |
CMP | Applied Materials | 9500 |
| |
CMP | Applied Materials | 5200 Centura |
| |
CMP | Applied Materials | 8300A-0020 | Oxide Etcher | |
CMP | Applied Materials | AMAT 5200 CENTURA |
| |
CMP | Applied Materials | AMAT P5000 | CVD | |
CMP | Applied Materials | AMAT P5000 |
| |
CMP | Applied Materials | AMAT ULTIMA X 300MM | HDPCVD | |
CMP | Applied Materials | Centura 5200 DPN |
| |
CMP | Applied Materials | Centura 5200 DPN |
| |
CMP | Applied Materials | Centura 5200 Metal Etch MxP |
| |
CMP | Applied Materials | Centura 5200 Oxide Etch MxP+ | ||
CVD | Applied Materials | Centura RTP XE+/Wsix |
| |
CVD | Applied Materials | Centura SACVD |
| |
CVD | Applied Materials | Compass |
| |
CVD | APPLIED MATERIALS | DR SemVision | SEM Based Defect Review System | |
CVD | Applied Materials | Excite | High Speed Particle Detection | |
CVD | Applied Materials | Excite IPM | Unpatterned Wafer Inspection | |
CVD | Applied Materials | HDPEtch Chamber |
| |
CVD | Applied Materials | IPM 832 |
| |
CVD | Applied Materials | P5000 | CVD | |
CVD | Applied Materials | P5000 Mark II Metal |
| |
CVD | Applied Materials | P5000 Mark II Metal |
| |
CVD | Applied Materials | P5000 Mark II Metal |
| |
CVD | Applied Materials | P5000 Mark II Metal |
| |
CVD | Applied Materials | Reflexion - ILD |
| |
CVD | APPLIED MATERIALS | Type 3 | On Board TEOS Hot Box, 6 Channels | |
CVD | Applied Materials | 5000 | 3 Ch SACVD System, refurbished | |
CVD | Applied Materials | 5000 | 3 Ch Silane PECVD system, refurbished | |
CVD | Applied Materials | Centura 5200 | 2 Ch DPS R1 poly etch system, refurbished | |
CVD | Applied Materials | Centura 5200 | 3 Ch eMxP+ oxide etch system, refurbished | |
CVD | Applied Materials | Centura 5200 | 4 Ch DXZ PECVD System, refurbished | |
CVD | Applied Materials | Centura 5200 | 4 Ch DXZ SACVD System, refurbished | |
CVD | Applied Materials | Centura 5200 | Ald Centura System | |
CVD | Applied Materials | Centura 5200 | MxP Etch system - Oxide 200mm | |
CVD | Applied Materials | Opal 7830i | CD SEM | |
CVD | Applied Materials | SEM VISION CX | SEM | |
CVD | APT | 3145 | Metal Etch Tools with Robotic Handling, for 75mm to 200mm Wafers, 2ea Available | |
CVD | Arch | Genstream | Arch Teos Delivery System (New) | |
CVD | ASM | Polygon Platform | Thin Film | |
CVD | ASML | 2500/40 | i-Line Wafer Stepper | |
CVD | ASML | PAS 5000 / 45 | STEPPER | |
CVD | ASML/SVG US INC | MSII+ | Track | |
CVD | ASML/SVG US INC | SERIES 90-S | Track | |
CVD | ASML/SVG US INC | SERIES 90-S | Track | |
CVD | Asyst | SMIF 300 WMS | Wafer Management system | |
CVD | Atcor | CRD-2410 | Box Washer | |
CVD | Avsi | AVSI 480BT |
| |
CVD | Axcelis | 200 PCU |
| |
CVD | Axcelis | 200PCU | Photostabilizer | |
CVD | Axcelis | AC2 | Ozone Asher | |
CVD | Axcelis | HC3 Ultra 5.5 | Ion Implanter- 300mm-13 wafer batch- 4 PDOs- full 300mm factory automation-exc condition | |
CVD | Axcelis / Fusion | 200 ACU | Ashing System | |
CVD | Axcelis / Fusion | M 200 PC | UV Cure System | |
CVD | Balzers | BAK 760 | High Capacity High Vacuum Evaporation System | |
CVD | Bay Voltex HS 0550-AC-SX-ENL | HS 0550-AC-SX-ENL |
| |
CVD | Bay Voltex LT-1650-WC-DI-AM Chiller | LT-1650-WC-DI-AM Chiller |
| |
CVD | Benchmark Gen II | SM-8000 | Parallel Seam Sealer | |
CVD | Biorad | Bio-RAD | Overlay and CD Measurement System | |
CVD | Biorad | Bio-RAD | Overlay and CD Measurement System | |
CVD | BIORAD | Q6 | Overlay Metrology Tool | |
CVD | BIORAD | Q7/Q8 | Overlay Metrology Tool for up to 200mm Wafers, 3ea Available | |
CVD | BIORAD | QS-300 | FTIR Epi Thickness Monitor for up to 150mm Wafers | |
CVD | BIORAD | QS-300 | FTIR Epi Thickness Monitor for up to 200mm Wafers | |
CVD | BIORAD | QS-500 | FTIR Epi Thickness Monitor for up to 200mm Wafers | |
CVD | Blue M | DCC-256F | Oven | |
CVD | Blue M | IGF-6680F-4 | Blue M Ultra Temp Oven | |
CVD | Blue M | DCC 256C | Cleanroom Oven | |
CVD | Blue M | Model CW-190G-MP2 | High Temp Oven | |
CVD | Blue M | Model DCC-146C |
| |
CVD | Bold | PT1180, PT1184 | Bold Recirculators | |
CVD | Branson | IPC 4000 | Barrel Asher | |
CVD | Brewer Science | CEE 100 System |
| |
CVD | Brooks | 8100 |
| |
CVD | Brooks | various | Brooks Mass Flow Controllers | |
CVD | Buehler | Budzar Ice Chiller | Chiller | |
CVD | Cannon | FPA-3000-i4 | Wafer Stepper | |
CVD | Cannon | FPA-3000-i4 | Wafer Stepper | |
Defect Metrology | Cannon | FPA-3000-i4 | Wafer Stepper | |
Defect Metrology | Cannon | FPA-3000-i5 | Wafer Stepper | |
Diffusion | Cannon | FPA-3000-iW | Wafer Stepper | |
Diffusion | Cannon | FPA-3000-iW | Wafer Stepper | |
Diffusion | Canon | 1550 | Mark V steppers, G line | |
Diffusion | Canon | Aligner(PLA-501FA) |
| |
Diffusion | CANON | APT5850 | TEOS-3 CVD | |
Diffusion | Canon | FPA 1550 | g line stepper | |
Diffusion | Canon | FPA1550M3W | g line stepper | |
Diffusion | CANON | MAS8000 | Asher | |
Diffusion | CANON | MAS8000 | Asher | |
Diffusion | CANON | MAS8000 | Asher | |
Diffusion | CANON | MAS8000 | Asher | |
Diffusion | CANON | MAS-8000 | Asher | |
Diffusion | CANON | MAS-801 | Asher | |
Diffusion | Canon | MPA 500 | Projection Mask Aligner | |
Diffusion | Canon | PLA 501F | Parallel Light Mask Aligner Cassette to cassette Mask aligner for 2"-5" wafer | |
Diffusion | CANON | PLA501FA | Mask Aligner | |
Diffusion | Canon | PLA 501F | Parallel Light Mask Aligner Cassette to cassette Mask aligner for 2"-6" wafer | |
Diffusion | Carl Zeiss | MSM100 / AIMS |
| |
Diffusion | CDE | ResMap 378 | Resistivity Mapping Tool, for up to 300mm Wafers | |
Diffusion | CDE | ResMap168 | Automated four point probe for resistivity and metal thickness mapping | |
Diffusion | CHA | MPS 4 | Multiposition Horizontal Sputtering system | |
Diffusion | CHA | SSB 600 | Single Target DC Magnetron Sputting system | |
Diffusion | Chapman | MP 2000 Plus | Laser Profiler | |
Diffusion | CR TECHNOLOGY | CRX-1000 | Real Time Xray Imaging System | |
Diffusion | Creative Design Engineering (CDE) | ResMap 463 |
| |
Diffusion | Creative Design Engineering (CDE) | ResMap 463 |
| |
Diffusion | Credence | 212 | Parts Machine Only | |
Diffusion | Credence | IDS2000 | Tester | |
Diffusion | Credence | Kalos PK1 | Automated Test Prober for Flash Memory | |
Diffusion | Credence | Personal Kalos |
| |
Diffusion | CVC | 611 | Loadlock Deposition System Sputter Capability up to 6" | |
Diffusion | Daito Shoji | F-3555 | RETICLE INSPECTION | |
Diffusion | Dektak | 3 Series | Surface profilometer and step height measurement | |
Diffusion | Delatech | 858-4 | Delatech CDO System | |
Diffusion | Delta Design | 1020 FLEX HNDLR | Handler | |
Diffusion | Delta Design | 1020 FLEX HNDLR | Handler | |
Diffusion | Delta Design | 1210 FLEX HNDLR | Handler | |
Diffusion | DELTRONIC | DV-114 | Optical Comparator with Digital XY Readout | |
Diffusion | Despatch | CRB |
| |
Diffusion | DISCO | DFD620 | Dicing Saw | |
Diffusion | DJ-807 | Kokusai | 4 Chamber Furnace w/ preclean | |
Diffusion | DNS | 626 | Coater, Developer | |
Diffusion | DNS | DNS-629 | PR Coater | |
Diffusion | DNS | DNS-629 | PR Coater | |
Diffusion | DNS | DNS-629 | PR Coater | |
Diffusion | DNS | FC-821L | 1 BATH RCA SCRUBBER | |
Diffusion | DNS | FC-821L |
| |
Diffusion | DNS | FC-821L |
| |
Diffusion | DNS | SC-W60A-AVFG | SOG Coater | |
Diffusion | DNS | SCW-80A-AV(Q) | POLYMID COATER | |
Etch | DNS | SC-W80A-AVFG | SOG Furnace with Interface | |
Etch | DNS | SC-W80A-AVG | SOG Coater | |
Etch | DNS | SK200W-RVPE | Track System | |
Etch | DNS | SK-W80A-BVP | Photoresist Coater/Developer, 3 Coat, 2 Develop, 200mm Wafers | |
Etch | DNS | SK-W80A-BVP | Track System | |
Etch | DNS | SKW-80A-BVPE | Photoresist Coater/Developer, 1 Coat, 2 Develop, WEE for 200mm Wafers | |
Etch | DNS | SR-3000 | Cleaner | |
Etch | DNS | SS-W80AAR |
| |
Etch | DNS | VM-8200 | Thickness Measurement | |
Etch | DNS | VPC |
| |
Etch | DNS | WS-820C | Automated Wet Processing System with IPA Vapor Dryer, 200mm Wafers | |
Etch | DNS | 629 | PR coater | |
Etch | DNS | W80 | SOG Coater | |
Etch | DNS- Dainipponscreen | DP-636-C | 3 Tracks with each 3 hotplate and 1 coolplate. Each track has 1 carrier send and 1 receive. | |
Etch | DNS-Dainipponscreen | DP-636-C | 1 Coater unit 4 Hotplates 2 Coolplates 4 Carriers 2 coating systems with pressuredispence from the tank/bottle each is suported with a traptank. Suitable for any Type of Photoresist. | |
Etch | Dryden | DE3496SPD |
| |
Etch | Drytek | Megastrip 6 | Drytek Megastrip 6 | |
Etch | Duo | Credence | VLSI, Tester 50/100 Mhz Conf. 60Mhz 1digital capture board W/8 pins, 2 abbitary waveform Generator boards for 16 pins AWG. | |
Etch | Dupont | 120ssa | Helium Leak Detector | |
Etch | DUSAN | Smart Die | Trim & Form Press, 5ea Available | |
Etch | DYNATEX | DX-III | Wafer Scriber/Breaker | |
Etch | E G & G Instruments | Model 263A |
| |
Etch | EALING INSTRUMENTS | 6' Long | Optical Bench | |
Etch | Eaton | H143 (NV-10-80) | Implant | |
Etch | Ebara | 2.1 | Ebara 2.1 Cryo Compressors | |
Etch | Ebara | 4.8 | Ebara 4.8 Cryo Compressors | |
Etch | Ebara | EPO | Ebara Integrated Polish Configurations | |
Etch | Edax | CM200ST Alpha 147-5 | Failure Analysis | |
Etch | Edax | EDX | Failure Analysis | |
Etch | EEJA | POSFER |
| |
Etch | Electroglas | 4085cx | Prober with hot chuck | |
Etch | Electroglas | 4090u | Prober | |
Etch | Electroglas | 5/300e | Prober, 300mm, hot/cold nickel chuck, -55degC-+200degC, Auto probe to pad, chiller, manip. | |
Etch | Electroglas | EG 4085 | Prober | |
Etch | Electroglas | EG 4085X | Prober | |
Etch | Electroglas | Horizon 4085X | Automatic Wafer Prober | |
Etch | Electrotech | LF-24 |
| |
Etch | EM-1 | Prometrix |
| |
Etch | ENI | ACG-10 | Generator | |
Etch | ENI | HF-1 | Generator | |
Etch | EPRO | 142AX | Memory Tester | |
Etch | Ergolux | Ergolux | Microscope | |
Etch | ESEC | 2005 LOC | Automatic Die Bonder | |
Etch | ESEC | 3006F/X | ESEC 30006F/X Wire Bonder | |
Etch | ESI | 9800 |
| |
Etch | ESI | 9800 |
| |
Etch | ESI | 9800 |
| |
Etch | ESI | 9800 |
| |
Etch | ESI | 9250A | Laser Semiconductor Processing System, 1996 | |
Etch | ESI | 9250B | Laser Semiconductor Processing System, 1996 | |
Etch | ESI | 8000/200 | Laser Processing System | |
Etch | ESI Inc | 9820 | Laser Repair | |
Etch | Estek | WIS-800 |
| |
Etch | Estek Wis | 600 | Inspection System Wafer Surface Analysis System Capability 3" to 6" wafers. | |
Etch | ETS Lindgren | 5407 |
| |
Etch | Evertech | UNKNOWN |
| |
Etch | EVG | 540 G2W | Die Bonder | |
Etch | Fein Focus | F3D-160-10(V) | Xray | |
Etch | FICO | TFM-1A | Lead Forming Tool | |
Etch | FLX2320 | KLA-TENCOR |
| |
Etch | Fortrend | See Listing | Fortrend Wafer Transfers | |
Etch | Four Dimension Movec | 280TC | Automated 4 Point Probe Capable of 100mm to 200mm wafers | |
Etch | FSI | 8221 | Spin Rinse Dryer | |
Etch | FSI | Excalibre | Vapor Cleaner | |
Etch | FSI | Excalibre | Vapor Cleaner | |
Etch | FSI Polaris | 1000 | Microlithography Cluster tool (Coat / Dev) Capability 3" to 6" wafers | |
Etch | Fusion | 150 PC | UV systems | |
Etch | Fusion | 150PC-200PCU- Gemini | Photostablilizers and EPROM erasers (dual application) | |
Etch | Fusion | 200PC | Photostabilizer | |
Etch | Fusion | Asher |
| |
Etch | Fusion | Asher |
| |
Etch | Fusion | G03 | Photostabilizer | |
Etch | Fusion | G03 | Photostabilizer | |
Etch | Fusion | M200 PCU |
| |
Etch | Fusion Systems | PS3 UV Harden | Photoresist Curing | |
Etch | Fusion Systems | PS3 UV Harden | Photoresist Curing | |
Etch | GAERTNER | Stokes LSE | Ellipsometer, Manual 300MM max | |
Etch | Gasonics | AE2001 | EtcherSingle wafer down-stream isotropic etch system | |
Etch | Gasonics | AE2001 | Etcher Single wafer down-stream isotropic etch system | |
Etch | Gasonics | Aura 1000 | Photoresist Asher 75mm to 150mm wafer capability | |
Etch | Gasonics | Aura 2000LL | Loadlock Asher Configured for 4"- 8" Wafers | |
Etch | Gasonics | Aura 2000LL | Loadlock Asher Configured for 4"- 8" Wafers | |
Etch | Gasonics | L3510 | Single Wafer Ashing System Substrate Size: 3-8inch / 75mm-200mm | |
Etch | GCA/TROPEL | 9000 | Surface Flatness Analyzer | |
Etch | GD-Takatori | 1100 | Gold- Grind | |
Etch | GD-Takatori | 2100 | Gold- Grind | |
Etch | Gemini | Gemini 3 | Dual Chamber Epitaxial Reactor | |
Etch | Gemini | Gemini II | Gemini II EPI Reator (Left Side Controller) | |
Etch | Gemini | Gemini II | Gemini II EPI Reator (Right Side Controller | |
Etch | Genesis | Tester II | Tester II | |
Etch | Genesis | Tester II | Tester II | |
Etch | Genus | Lynx 2 | CVD | |
Etch | Geringer |
|
| |
Etch | GSI Lumonics | HM1400L | Laser Marking system | |
Etch | Hach One Laboratory | Hach One Laboratory PH/Meter | ||
Etch | Hipox | Gasonics | w/Haskel Pumps, up to 125mm | |
Etch | Hirayama | PC305S III |
| |
Etch | Hirayama | PC305S III |
| |
Etch | HITACHI | 4500 |
| |
Etch | Hitachi | 308 ATE | Poly Etcher | |
Etch | Hitachi | 7280H |
| |
Etch | Hitachi | HI TECH 308 | Etcher | |
Etch | Hitachi | HI TECH 308 | Etcher | |
Etch | Hitachi | HI TECH 8820 |
| |
Etch | HITACHI | IRG-10-T10 | REVIEWER | |
Etch | Hitachi | IS-2000 | Total Reflection X-Ray Fluorescence TRXRF | |
Etchers | HITACHI | IS2500 | WAFER INSPECTION | |
Etchers | HITACHI | LS-6030K | Particle Inspection | |
Implant | HITACHI | S-4160 | FE-SEM | |
Implant | Hitachi | S-4500 |
| |
Implant | Hitachi | S-6000 | CD SEM | |
Implant | Hitachi | S-6000 | CD SEM | |
Implant | HITACHI | S-6000 | Field Emission CDSEM, 2ea Available | |
Implant | Hitachi | S-7000 | CD SEM | |
Implant | HITACHI | S-7000 | CD SEM Measurement Tool, 2ea Available | |
Implant | Hitachi | S-7800 | CD SEM | |
Implant | HITACHI | S-8820 | CD-SEM | |
Ion Implantors | HITACHI | S-8820 | 200mm | |
Mask | HITACHI | S-9260 | SEM | |
Mask | HITACHI | S-9260 | SEM | |
Mask | HITACHI | SEM S7000 |
| |
Mask | HITACHI | SEM S7800 |
| |
Mask | Hitachi | 8820 | CD Sem | |
Mask | Holon | EMU220 |
| |
Mask | Hypervision | Visionary 2000 | Emission Microscope | |
Mask | ICF |
| EKC Wet station | |
Mask | ICF |
| Tube Cleaner for Vertical furnace | |
Metrology | ICP Multiplex | STS | Inductively coupled plasma, GaN Bluechip, vintage 2002 | |
Metrology | IMS Tester | ATS 1271 | Tester- spare system | |
Metrology | IMS Tester | ATS 1271 | Tester-full system | |
Metrology | Inficon | TRS-H200M | GAS ANALYZER | |
Metrology | Innolas | IL C 3000 DPS | Laser YAG | |
Metrology | Innotec | VS 24C | 5 Target DC Sputtering System | |
Metrology | Inova | Novellus | PVD 200mm | |
Metrology | Inspex | TPC8500 | Total Reflection X-Ray Fluorescence TRXRF | |
Metrology | Inspex | TPC8520 | Total Reflection X-Ray Fluorescence TRXRF | |
Metrology | Inspex | TPC8525 | Total Reflection X-Ray Fluorescence TRXRF | |
Metrology | Inspex | TPC8525M | Total Reflection X-Ray Fluorescence TRXRF | |
Metrology | Inspex | TPC8530 | Total Reflection X-Ray Fluorescence TRXRF | |
Metrology | Integrated Dynamics Eng | TC | Shock Vibration | |
Metrology | Ion Tech Inc | Sourcerer | Ion Beam System Dual Ion Beam Deposition | |
Metrology | IONIC | Stressgage | Wafer Film Stress Tester, 2ea Available | |
Metrology | IPEC | 472 / 372M | Rotational CMP Platforms | |
Metrology | IPEC/Speedfam | Auriga / Auriga C | 5-Head Standalone or Integrated CMP Polisher | |
Metrology | IRVINE OPTICAL | Ultrasort 606 | Robotic Bar Code Reader/Wafer Sorter | |
Metrology | IRVINE OPTICAL | UltraSpec | Wafer Inspection Station with Nikon Optiphot 150 Optics, NeoPlan2 5X, 20X & 100X Obj | |
Metrology | IRVINE OPTICAL | UltraSpec III | Wafer Inspection Station with Nikon Optiphot, DIC Optics, Isolation Table | |
Metrology | IVI | Box Coater | 48 inch thermal evaporator | |
Metrology | IVS | 200 | Wafer Inspection System | |
Metrology | JEOL | JSM-6360LV | Scanning Electron Microscope | |
Metrology | Jeol | JWS 7505 | CD CEM | |
Metrology | JEOL | JWS 7515 | Microscope | |
Metrology | JEOL | JWS 7700 | CD Sem | |
Metrology | JEOL | JWS-7515 | SEM Based Wafer Inspection Tool | |
Metrology | JLSI | IPS8653D | JLSI Test Handler | |
Metrology | JOEL | JWS-7700 |
| |
Metrology | JWS 7515 | JEOL |
| |
Metrology | K&S | 1472 | Wire Bonder | |
Metrology | K&S | 6497 | Semi-Automatic Flip Chip Die Bonder | |
Metrology | K&S | 1470-4 | Automatic Hybrid Wedge Bonder, 200mm x 200mm Travel | |
Metrology | K&S | 1470-4 | Automatic Hybrid Wedge Bonder, 100mm x 100mm Travel | |
Metrology | Karl Suss | MA150 | Mask Aligner | |
Metrology | KARL SUSS | MJB-3 | Mask Aligner with Split-Field Optics, Model 505 UV Power Supply | |
Metrology | KARL SUSS | RA120M | Wafer Scriber | |
Metrology | Karl Suss | MA-150ML | Manual Mask Aligner w/ Video Backside Alignment | |
Metrology | Karl Suss | MA56 | Mask Aligner Exposure System | |
Metrology | Karl Suss | MA6 | Mask Aligner / Exposure SystemSystem Capable of 2" to 6" Wafers | |
Metrology | Karl Suss | RA120M | Scriber | |
Metrology | Kensington | CSMT-2 | 2 Stage Wafer Sorter | |
Metrology | KETEK | RMM 530 | Manual Load Rubbing Machine for LCDs | |
Metrology | Kevex | 771 SEMICRON |
| |
Metrology | Kevex | Omicron XRF |
| |
Metrology | Kevex | Omicron XRF |
| |
Metrology | Kinergy | Auto Frame Loader | Assembly Hybrid | |
Metrology | Kinergy | Auto Frame Loader | Assembly Hybrid | |
Metrology | Kinetek | DRS 200 | Optical Inspection and Defect Review StationSystem Capable of 4" to 8" Wafers | |
Metrology | KLA | Fab VARS 500 | Digital Image Management System | |
Metrology | KLA | KLA2552 | 1998 | |
Metrology | KLA | 2131 | Defect Inspection System Upgraded to 2132 4" to 8" Water Capability | |
Metrology | KLA | 2132 | High Speed Multilayer Wafer Inspection for Process Defects | |
Metrology | KLA | Tencor P20H | Long Scan Profiler Capability to handle 3" to 8" wafer | |
Metrology | KLA Tencor | 6200 | Surfscan Wafer Surface Contamination Analyzer Capable up to 8" Wafers | |
Metrology | KLA Tencor | 6220 | Surfscan Wafer Surface Inspection System 4" to 8" Water Capability | |
Metrology | KLA Tencor | 6420 | Surfscan Unpatterned Surface Inspection System Capable up to 8" Wafers | |
Metrology | KLA Tencor | Alpha Step 200 | Profiler System Capability to handle 3" to 8" wafer | |
Metrology | KLA Tencor | Flexius FLX 2320 | Thin Film Stress Measurement System Wafer Sizes:100 to 200mm | |
Metrology | KLA Tencor | M-Gage 300 | Non-Contact Mettallization Monitor Capability Capability 2" to 6" wafers | |
Metrology | KLA Tencor | P2 | Long Scan Profilometer Sample Size: up to 200 mm | |
Metrology | KLA Tencor | Surfscan 354 | Capability 2" to 5" wafers | |
Metrology | KLA Tencor | Surfscan 4500 | Surface Particle Inspection Analyzer Capability 3" to 6" wafers | |
Metrology | KLA Tencor | Surfscan 5500 | Surface Particle Inspection Analyzer Capability 4" to 8" wafers | |
Metrology | KLA Tencor | Surfscan 7000 | Pattern particle and microscan | |
Metrology | KLA Tencor | Surfscan 7200 | Patterned Wafer Particle Inspection SystemSubstrate Size: 4"to 8 | |
Metrology | KLA Tencor | Surfscan 7700 | Surfscan Patterned / Unpatterned Wafer Inspection System | |
Metrology | KLA Tencor | TF1 | Film Thickness Measurement System Substrate Size: 4" to 8" | |
Metrology | KLA Tencor | TF2 | Film Thickness Measurement System Capability 100 to 200mm wafer | |
Metrology | KLA Tencor | UltraPointe 1010 | Laser Imaging System Defect Review Station- Capable of 4" to 8" Wafers | |
Metrology | KLA 2132 | controller | Controller | |
Metrology | KLA 91 |
|
| |
Metrology | KLA TENCOR | 2135 | Wafer Defect Inspection System | |
Metrology | KLA TENCOR | HRP 100 | Profilometer | |
Metrology | KLA Tencor | es20XP | Wafer Inspection | |
Metrology | KLA TENCOR | eS20XP | Electronic Beam Wafer Inspection | |
Metrology | KLA TENCOR | eS20XP | Electronic beam wafer inspection | |
Metrology | KLA Tencor | FLX-5200H | Stress Guage | |
Metrology | KLA TENCOR | HRP 220 | Inspection System | |
Metrology | KLA Tencor | KLA-2132 | Particle Inspection | |
Metrology | KLA Tencor | KLA-5300 | MASK WAFER INSPECTION | |
Metrology | KLA TENCOR | P20 | Profile Measurement | |
Metrology | KLA TENCOR | Quantox | In-Line Electrical Measurement System | |
Metrology | KLA Tencor | SFS-7000 | Surfscan | |
Metrology | KLA Tencor | SURFSCAN AIT-1 | WAFER INSPECTION | |
Metrology | KLA-Tencor | 2132 |
| |
Metrology | KLA-Tencor | 5000 | Coherence Probe Metrology | |
Metrology | KLA-TENCOR | 5105 |
| |
Metrology | KLA-Tencor | 5200 |
| |
Metrology | KLA-Tencor | 6200 |
| |
Metrology | KLA-Tencor | 6200 | Surface Scanner | |
Metrology | KLA-Tencor | 6220 |
| |
Metrology | KLA-Tencor | 6220 |
| |
Metrology | KLA-TENCOR | 6400 |
| |
Metrology | KLA-TENCOR | 7700 |
| |
Metrology | KLA-Tencor | 7700 |
| |
Metrology | KLA-Tencor | 7700 |
| |
Metrology | KLA-Tencor | 7700 |
| |
Metrology | KLA-Tencor | 5200XP |
| |
Metrology | KLA-TENCOR | 7700M |
| |
Metrology | KLA-Tencor | ABI 2000 |
| |
Metrology | KLA-Tencor | AIT |
| |
Metrology | KLA-TENCOR | AlphaStep 300 | Profilometer | |
Metrology | KLA-Tencor | CRS-1010S |
| |
Metrology | KLA-TENCOR | CRS-3000 | Confocal Review Station for up to 300mm Wafers | |
Metrology | KLA-Tencor | ev300 |
| |
Metrology | KLA-Tencor | Flex-5200h | Automated Thin Film Stress Measurement | |
Metrology | KLA-Tencor | HRP-220 | High Resolution Profiler | |
Metrology | KLA-Tencor | KLA 2135 |
| |
Metrology | KLA-Tencor | KLA 3800L |
| |
Metrology | KLA-Tencor | KLA2130 M/B | WAFER INSPECTION | |
Metrology | KLA-Tencor | KLA2130/2111 OPERATION RAC | ||
Metrology | KLA-Tencor | KLA2130/2111 OPERATION RAC | ||
Metrology | KLA-Tencor | KLA2550 REVIEW STATION | Review Station | |
Metrology | KLA-Tencor | KLA5107 | Overlay Inspection System - Parts Machine | |
Metrology | KLA-Tencor | Omnimap NC-110 | Non Contact Resistivity | |
Metrology | KLA-TENCOR | P-2 | Long Scan Profiler | |
Metrology | KLA-Tencor | P20H | Long Scan Profiler Capability to handle 75mm to 200mm wafers | |
Metrology | KLA-Tencor | P-22 | Profiler | |
Metrology | KLA-TENCOR | P-2H | Long Scan Profiler with Cassette to Cassette Wafer Handling, for up to 200mm Wafers | |
Metrology-Test Systems | KLA-Tencor | Prometrix FT-600 | Patterned Wafer Film thickness Measurement | |
Metrology-Test Systems | KLA-Tencor | Prometrix FT-700 | Patterned Wafer Film thickness Measurement | |
Miscellaneous | KLA-Tencor | Prometrix RS35 | Resistivity Mapping system 4 Point Probe | |
Other | KLA-Tencor | Prometrix RS50/E | 4 Point Probe, High Resistivity | |
Other | KLA-Tencor | Prometrix RS55/TC | 4 Point Probe, High Resistivity Mapping w/ Temp Compensation | |
Other | KLA-Tencor | Prometrix UV-1050 | Film Thickness Mapping | |
Other | KLA-TENCOR | RS55 | Resistivity Mapping Tool, for Copper Only | |
Other | KLA-Tencor | RS55 | Resistivity | |
Other | KLA-Tencor | Sufscan 7200 | Patterned Wafer Particle Counter | |
Other | KLA-Tencor | Sufscan 7200 | Patterned Wafer Particle Counter | |
Other | KLA-Tencor | Surfscan 5500 | Wafer Contamination Monitor | |
Other | KLA-Tencor | Surfscan 6100 | Unpatterned Wafer Surface Contamination Analyzer | |
Other | KLA-Tencor | Surfscan 6200 | Wafer Surface Analyzer for Non Patterned Wafers | |
Other | KLA-Tencor | Surfscan 6400 | Wafer Surface Analyzer for Contaminating Particles | |
Other | KLA-Tencor | Surfscan 7000 | Patterned Wafer Contamination Analyzer | |
Other | KLA-Tencor | Surfscan 7600 | Particle Inspection for Patterned and Unpatterned Wafers | |
Other | KLA-Tencor | Surfscan AIT | Advanced inline Defect Inspection | |
Other | KLA-TENCOR | Surfscan SP1 Classic | Unpatterned Wafer Surface Inspection Tool, for 200mm-300mm Wafers | |
Other | KLA-TENCOR | Surfscan7700 |
| |
Other | KLA-Tencor | UV 1050 |
| |
Other | KLA-Tencor | UV 1050 |
| |
Other | KLA-Tencor | UV 1050 |
| |
Other | KLA-Tencor Prometrix | FT 650 | FILM Thickness MEASUREMENT SYSTEM | |
Other | Kokusai | VERTRON III |
| |
Other | Kokusai | Vertron III(F)/Vertex(F)/DD-823V/DJ-823V | ||
Other | Kokusai | Vertron V(S)/Vertex V(S)/DD-835V/DJ-835V | ||
Other | Kokusai | Vertron V(S)/Vertex V(S)/DD-835V/DJ-835V | ||
Other | KOYO | VF-5100B | VERTICAL ALLOY FURNACE | |
Other | KOYO Lindberg | VF-5100 | Oxide Furnace | |
Other | KVD | M2i | KVD Tester | |
Other | LAM | 490 | Poly Oxide Etcher | |
Other | LAM | 590 | Oxide Etcher | |
Others | Lam | 2300 | Etcher - Transfer Module - TM | |
Oven | Lam | 4420 | Polysilicon Etcher | |
Ovens | Lam | 4420 | Polysilicon Etcher | |
Photo | Lam | 4428 | Etcher | |
Photo | LAM | 4528 | Etcher | |
Photo | LAM | 9408 | Etcher | |
Photo | LAM | 9600SE |
| |
Photo | Lam | 9600SE | Metal Etcher | |
Photo | Lam | Alliance 9400 PTX | 1-chamber system | |
Photo | Lam | Alliance A6 |
| |
Photo | LAM | DSM9800 | LPCVD Reactor 1 Integrity | |
Photo | LAM | TCP 9600SE | Plasma Metal Etch System | |
Photo | LAM | TCP9600 |
| |
Photo | LAM | TCP-9608SE | METAL Etch | |
Photo | LAM | 4600B | Aluminum Etcher, 200mm | |
Photo | LAM / Drytek | LRC 200 SERIES 0 | Etcher | |
Photo | LAM / Ontrak | DSS 200 | Post CMP cleaner/MTSC-1 SCRUBBER | |
Photo | LAM RESEARCH | 4420 | Polysilicon Plasma Etcher for 150mm Wafers | |
Photo | Lam Research | 9400 |
| |
Photo | Lambda Physik | A4003 | Excimer Laser- 193nm (ArF) Excimer laser for lithography applications. This is a 5 Watt 4Khz laser with a 0.3pm Bandwidth spec. | |
Photo | LAURIER | DS-3000 | Autonmatic Die Attacher | |
Photo | Laurier | DS-7000 | Pick and Place | |
Photo | Leica | INS 2000 |
| |
Photo | Leica | MIS 200 |
| |
Photo | Leica | MIS 200 |
| |
Photo | Leica | MIS 200 |
| |
Photo | Leica | MIS200 | Wafer Inspection and Review | |
Photo | Leitz | MPV-SP | Microspectroscope | |
Photo | Leitz | SP Automatic | Microspectroscope | |
Photo | Leitz | Ergolux | Microsciope 6 inch Stage | |
Photo | LEO | LTA-700 | Life-time Measurement | |
Photo | Lepel | J-125-3-KC-TL | Lepel RF Generator (228KVA) | |
Photo | Leybold | 100P | Leybold Dry Vacuum Pump | |
Photo | Leybold | D30A | Leybold D30A Vacuum Pump | |
Photo | Leybold | D60A | Leybold D60A Vacuum Pump | |
Photo | Leybold | WSU150 | Leybold WSU150 blower | |
Photo | Leybold | Z 660 | Load Locked 4 Target RF and DC Sputter with Etch | |
Photo | LFE | PDS-504 | Plasma Cleaning Tool | |
Photo | LFE | PUC-301 | Plasma Cleaning Tool | |
Photo | Linberg |
| Blue OvenChamber Size: 25"H x 16"D x 22"WMax Temp: 300c | |
Photo | LMS IPRO | Leica |
| |
Photo | LTX | Delta Turboflex |
| |
Photo | LUMONICS | WaferMark 2 | YAG Laser Wafer Marking System | |
Photo | LUMONICS | WaferMark 200HS | YAG Laser Wafer Marker for up to 200mm Wafers | |
Photo | LUMONICS | WaferMark 345-1 | YAG Laser Wafer Marking System | |
Photo | LUMONICS | WaferMark 345-2 | YAG Laser Wafer Marking System | |
Photo | Lumonics | Wafermark II | Laser ID System | |
Photo | Lumonics | Wafer Mark II | Laser Identification System Capable of handling 2" to 6" wafers. | |
Photo | MA6 | Karl-Suss | Mask Aligner | |
Photo | Mactronix | AWS BWI 600 | Microscope Loader / UV Inspection System | |
Photo | Marangoni | Dryer |
| |
Photo | Mark 7 | TEL | Polymide 2 coater, 2 developer | |
Photo | Mark 8 | TEL | Polymide 2 coater, 2 developer | |
Photo | MAT | 6947 | Semi-Automatic Flip Chip Die Bonder | |
Photo | Matrix | System One, Model 303 | Etcher | |
Photo | Mattson | CFM 8100 | Wet Station | |
Photo | MC Electronics | JLSI 8990 |
| |
Photo | MC SYSTEMS | 8806 | Analytical Probing System w/B/L MicroZoom Microscope, 2.25X, 8X, 25X Objectives | |
Photo | MCT | 2010 | Tester | |
Photo | MDC | CSM/16 | Automatic CV Plotter with 150mm DuoChuck, B&L SZ5 Microscope | |
Photo | MDC | CSM/2-7200 | Automatic CV Plotter with DuoChuck 8512-6NI 150mm Nickel Plated 6' (dia.) Dual Hot Chuck, Boonton 7200 Capacitance Meter | |
Photo | MDC | CSM/2-WIN-VF6-OS1 | Automatic CV Plotter with 490 QuietChuck 200mm DC Hot Chuck, H-P 4140B pA Meter/DC Voltage Source & H-P 4284A 20Hz – 1Mhz Precision LCR Meter | |
Photo | MERCATOR CONTROL | LF-5 | Plasma Stripper | |
Photo | Micro Automation | 1100 | Wafer Dicing SawCapable 3" to 6" Wafers | |
Photo | Micro Automation | 1006 | Programmable Dicing SawWafer dimensions 2"- 6" | |
Photo | Micro Automation | 1006 | Programmable Dicing SawWafer dimensions 2"- 6" | |
Photo | Microanalyst | 7500 | Microanalyst 7500 Masspectrometer | |
Photo | Micronics Japan | 705A | Manual Prober | |
Photo | MicroVu | H14 |
| |
Photo | MIT | Flexifab | Coater | |
Photo | MIT | Flexifab | Developer | |
Photo | MKII | TEL | Developer | |
Photo | Molecular Analytics | 47-NH3/NMP-102B-121 | ION Mobility Spectrometer | |
Photo | Mosaid | 3480 tester | 36 I/O- 144M Fail Bit Memory | |
Photo | Mosaid | 3480 tester | 18 I/O-18M Fail Bit Memory | |
Photo | Mosaid | 3480 testers | (36 I/O- 36M Fail Bit Memory) | |
Photo | Mosaid | 3490 tester | 36 I/O -36M Fail Bit Memory | |
Photo | MRC | 603 | 3 Target RF & DC Side Sputtering Etch | |
Photo | MRC | 662 | Sideways Sputter | |
Photo | MRC | 903M | Sputtering System DC w/RF Etch | |
Photo | MRC | 603 | Sputter SystemCapable up to 6" Wafers | |
Photo | MRC | 603-II | Side sputtering System w/ Etch | |
Photo | MRC | 603-III | Side sputtering System w/ RF Etch | |
Photo | MRC 662 |
| Sputter | |
Photo | MRC/TSC | 943 | Load locked 3 Target DC Sputtering system | |
Photo | MRL INDUSTRIES | 1024 | 2- Tube Horizontal Diffusion Furnace, 150mm Wafers | |
Photo | MRL INDUSTRIES | 1024 | 3-Tube Horizontal Diffusion Furnace w/Cantilever Loaders, 150mm Wafers | |
Photo | MRL INDUSTRIES | 14TC-45 | SMD IR Conveyor Furnace, 5 Zones, 9" Long Clamshell Chamber Design, MPU Controlled | |
Photo | MRL Industries | Model SLC 1248 | Diffusion Furnace Capable up to 200mm wafers | |
Photo | Nanometric | 4150 | Film Thickness Measurement and Mapping SystemSystemStandard wafer sizes 100mm to 200mm | |
Photo | Nanometrics | 181 | Film Thickness Measurement System | |
Photo | NANOMETRICS | Nanoline CD-50 | CD Measurement Tool | |
Photo | NANOMETRICS | Nanospec 181 | Film Thickness Measurement System | |
Photo | NANOMETRICS | Nanospec 181 | Film Thickness Measurement System | |
Photoresist Coaters-Tracks | NANOMETRICS | Nanospec 200 | Film Thickness Measurement System | |
Power Supplies-RF-Plasma-E-Gun | Nanometrics | Nanospec 210 | Film Thickness Measurement System Capable 5" to 6" Wafers | |
PVD | NANOMETRICS | Nanospec 8300 | Automatic Film Thickness Tool, Cassette to Cassette for up to 200mm Wafers | |
PVD | NANOMETRICS | Nanospec 9000 | Automatic In Situ Film Thickness Tools, 3ea Available | |
PVD | Nanometrics | Nanospec 9000(7000-0560) | Integrated Film Analysis System. | |
PVD | Nanometrics | Nanospec AFT 4000 | Scanning UV | |
PVD | Nanometrics | 8300XP | Thin Film MetrologyCapable of 100mm-300mm wafer handling | |
PVD | Neslab | CTF-75 | Neslab Coolflow CTF-75 Chiller | |
PVD | Neslab | HX-150 | Neslab HX-150 Chillers | |
PVD | Neslab | HX-75 | Neslab HX-75 Chillers | |
PVD | Neslab | RTE210 | Neslab RTE210 Chillers | |
PVD | Neslab | RTE211 | Neslab RTE211 Chillers | |
PVD | Neslab | CoolFlow RTE-221 |
| |
PVD | Neslab | DI Max |
| |
PVD | Neslab | HX 150 | Recirculating Chiller | |
PVD | Neslab | HX 300 | Recirculating Chiller | |
PVD | Newport | Autoalign PCS |
| |
PVD | Nextral 100 | Nextral |
| |
PVD | NICOLET | ECO-DX | FT-IR Spectrometer for Carbon, Oxygen & Epi Analysis, As-Is Only | |
PVD | NICOLET | ECO-MX 160-10MX | FT-IR Spectrometer, As-Is Only | |
PVD | Nicolet | MX-ECO | Nicolet MX-ECO | |
PVD | NIDEK | IM-7 | Wafer Inspection | |
PVD | Nikon | 3A |
| |
PVD | NIKON | i9 | i-Line stepper | |
PVD | NIKON | Metaphot | Binocular Microscope with 5X, 20X, 40X & 60X BF/DF Obj. Lenses, Polaroid Camera | |
PVD | Nikon | NPI 4425I |
| |
PVD | Nikon | NPI S202+ | Stepper | |
PVD | NIKON | NSR2005i10C | i-Line stepper | |
PVD | Nikon | NSR-2205i11D | STEPPER | |
PVD | Nikon | NSR-2205i11D | STEPPER | |
PVD | Nikon | NSR-2205i11D | STEPPER | |
PVD | Nikon | NSR-2205I12D | STEPPER | |
PVD | Nikon | NSR-2205i14E | STEPPER | |
PVD | Nikon | NSR-2205I14E | STEPPER | |
PVD | NIKON | NWL-851 | Cassette Wafer Loaders for up to 200mm Wafers, 3ea Available | |
PVD | NIKON | Optiphot 66 | Trinocular Numarski Microscope with 5X, 20X, 40X & 100X DIC Obj. Lenses, AFX-II Polaroid Camera | |
PVD | NIKON | Optiphot 66 | Binocular Microscope with 5X, l0X, 20X & 40X Obj. Lenses | |
PVD | NIKON | Optiphot 66 |
| |
PVD | NIKON | Optiphot 88 | Binocular Microscope with 5X, l0X, 20X & 40X Obj. Lenses, for 200mm Wafers | |
PVD | NIKON | Optistation | Wafer Inspection | |
Repair | NIKON | Optistation | Wafer Inspection | |
Repair | NIKON | Optistation 2A | Automatic Wafer Inspection Systems for 75mm- 150mm Wafers, Auto Focus, 4ea Available | |
Repair | NIKON | Optistation 3A | Automatic Wafer Inspection Station for 200mm Wafers, 2ea Available | |
Repair | Nikon | OST-5 | Optistation | |
Repair | NIKON |
| Toolmaker's Microscope | |
Repair | Nikon Metaphot |
| Microscope 6 inch Stage | |
Repair | NITTO DENKO | D-304 | Automatic Wafer Taper | |
Spares | NITTO DENKO | H-304 | Automatic Wafer Detaper | |
Spares | Nordicko | 8550 | Sputter | |
Subsystem | Nordiko | 8550 | RF and DC Sputtering System | |
Subsystem | Nova | NovaScan 210/420/840 | Standalone or Integrated Polish Configurations | |
Subsystem | Novellus | 676 | Planer | |
Subsystem | Novellus | C2 Altus |
| |
Subsystem | Novellus | C2 Sequel - 1 shrink chamber |
| |
Subsystem | Novellus | C2 Sequel - non shrink |
| |
Subsystem | Novellus | C2 SPEED/Sequel |
| |
Subsystem | NOVELLUS | Concept 2 Dual Speed S | SIN CVD | |
Subsystem | Novellus IPEC Speedfam | 676 | CMP 200mm | |
Subsystem | Novellus IPEC Speedfam | Novascan 372 ILD | CMP 200mm | |
Subsystem | Novellus IPEC Speedfam | Novascan 372 ILD | CMP 200mm | |
Subsystem | Novellus IPEC Speedfam | Novascan 372 ILD | CMP 200mm | |
Subsystem | Novellus IPEC Speedfam | Novascan 372 ILD | CMP 200mm | |
Subsystem | Novellus/Ipec/Speedfam | 372M | Planer | |
Subsystem | OLYMPUS | BH2-MJL | Wafer Inspection Microscope with NeoSPlan 5X, 10X, 20X & 50X Objectives, for 150mm Wafers | |
Subsystem | OLYMPUS | BHM | Wafer Inspection Microscope with NeoSPlan 5X, 10X, 20X & 50X Objectives | |
Subsystem | OnTrack | DSS-200 | Slli Series IIDouble Sided Scrub Track.Capable 4" to 8" wafers | |
Subsystem | OnTrak | DSS 200 Series 2 | Post CMP Cleaner | |
Subsystem | OnTrak | DSS 200 Synergy | Post CMP Cleaner | |
Subsystem | OnTrak | DSS-200 Series 1 |
| |
Subsystem | OnTrak | DSS-200 Series 1 |
| |
Subsystem | Opal | 7830i | Opal 7830i Sem (Parts Tool) | |
Subsystem | OPAL 7830i | APPLIED MATERIALS | CD SEM | |
Subsystem | Orbis | Wed | WAFER INSPECTION | |
Subsystem | OSI | 2100 | Overlay and CD Measurement System | |
Subsystem | OSI | IQ-155M | PARTICLE MEASUREMENT | |
Subsystem | OSI | IQ-155M | PARTICLE MEASUREMENT | |
Subsystem | OSI | IQ-155M | PARTICLE MEASUREMENT | |
Subsystem | OSI | Metra | Overlay and CD measurement system | |
Subsystem | OSI | VLS-I | Video line width CD measurement system | |
Subsystem | Oxford Instruments | 200 | Ion Beam Milling system | |
Subsystem | Oxford Instruments | 100 Plus | RIE Reactive Ion Etching system w/ Loadlock | |
Subsystem | Oxford Instruments | CMI 900 |
| |
Subsystem | Oxford Instruments | Plasmalab 80 Plus | Compact Flexible Reactive Ion Etcher | |
Subsystem | P2 | KLA-TENCOR |
| |
Test | P5000 | APPLIED MATERIALS | TEOS w/ Phase 4 bot box | |
Test | P5000 | APPLIED MATERIALS | 4 Chamber Sputter Etch | |
Test | P5000 | APPLIED MATERIALS | Trench Etch | |
Test | P5000 Metal Etch | APPLIED MATERIALS | 2 Metal etch, 1 ASP | |
Test | Pacific Western System | Probe II | Capable 4" to 6" | |
Test | Pacific Western System | Probe P5 |
| |
Test | Parker | AUTODOSER | Autodoser | |
Test | Perkin Elmer | 300 | Micralign Projection AlignerCapable of 3" to 5 | |
Test | Perkin Elmer | 4400 |
| |
Test | Perkin Elmer | 4410 |
| |
Test | Perkin Elmer | 4450 | 3 Target DC Sputtering | |
Test | Perkin Elmer | 2000 FTIR | SpectrophotometerSystem Capable of 6"and 8" and 12" Wafers | |
Test | Perkin Elmer | 544HT | Projection Aligner | |
Test | Perkin Elmer | 641HT | Projection Aligner Split Carriage Capable of 150 mm | |
Test | PERKIN-ELMER | 2400-8J | RF Sputtering System, 3ea 200mm Targets, RF Etch, RF Bias | |
Test | Philips | PLM-100 | Photoluminescence Mapping Tool | |
Test | PHILLIPS | PW2800 | Xray Fluorescence Metrology Tool for up to 200mm Wafers | |
Test | Phoenix | 160 OVHM | PCBA Analyzer, X-Ray Inspection | |
Test | Plasma 300 | Tepla | GaN Bluechip, 2 and 4 inch, CE Marking | |
Test | Plasma Technologies | ECR 2000/300 OR | Single Chamber Plasma Etch | |
Test | PlasmaTherm | 740 | RIE | |
Test | Plasmatherm | SL 730 | Pecvd | |
Test | Plasmatherm | SLR 730 | Pecvd | |
Test | PLASMA-THERM | Waf'r Batch 74 | RIE/Parallel Plasma Etcher | |
Test | Plasmatron |
| Electron Beam Evaporator | |
Test | PRI Automation | 1000- 2000- 4000- 5000 | New and refurbished robot | |
Test | PROMETRIX | FT-750 | Film Thickness Measuring Tool | |
Test | PROMETRIX | RS-35c | Resistivity Mapping Tool | |
Test | PROMETRIX | RS-55 | Resistivity Mapping Tool | |
Test | Prometrix | FT530 | Film Thickness Mapping SystemWafer Sizes: 3-3.25" and 100- 125-150-200 mm | |
Test | Prometrix | FT650 | Film Thickness Mapping System Standard Wafer Sizes: 3-3.25" and 100-125- 150- 200mm | |
Test | Prometrix | RS35C | Resistivity Mapping System 4"- 8" Capable | |
Test | Prometrix | RS35C | Resistivity Mapping System-Cassette to Cassette Load 4 Point Probe4"- 8" Capable | |
Test | Prometrix | RS55 | Resistivity Mapping SystemWafer size 2" - 8" Manual Load | |
Test | Prometrix | RS55 TC | Resistivity Mapping SystemWafer size 2" - 8" Manual Load | |
Test | Prometrix | SM300 | Film Thickness Mapping SystemSystemMaximum wafer size 200mm | |
Test | Prometrix | RS50 |
| |
Test | Prometrix | SM300 |
| |
Test | PS SYSTEMS | FPS6000 | Trim & Form Press, 5ea Available | |
Test | PS SYSTEMS | M-Press | Trim & Form Press, 4ea Available | |
Test | Pyramid Engineering | HPS-9000 | Seam Sealer | |
Test | QC Optics | API-3000 | QC Optics Photo Mask Inspection System | |
Test | Quantox 64000 | KLA-TENCOR |
| |
Test | Quickturn System | 16500BR |
| |
Test | Recif | IDLW8 | Handler | |
Test | REDDISH ELECTRONICS | SM500 CXE | Convection Reflow Oven | |
Test | REICHERT | Polylite SC | Wafer Inspection Microscope with 10X, 20X, 50X & 100X Plan Fluor Objective Lenses, Irvine Optical Ultrastation 3.C Model 2 Cassette Loader, for up to 150mm Wafers | |
Test | REID-ASHMAN | 60 Pin | Test Head Manipulator | |
Test | Reliability Line | various | Various ovens, temp cycle, humidity cycle used for microelectronics testing | |
Test | RIE | OXFORD INSTRUMENTS |
| |
Test | RIGAKU | 3630 | TXRF Wafer Analyzer | |
Test | RIGAKU | 3630 | TXRF Wafer Analyzer | |
Test | RIGAKU | 3750 | TXRF Wafer Analyzer | |
Test | RIGAKU | 3700H | TXRF Wafer Analyzer | |
Test | Rigaku | 3700H | Total Reflection X-Ray Fluorescence TRXRF | |
Test | Rigaku | 3726B | Total Reflection X-Ray Fluorescence TRXRF | |
Test | RIGAKU | DPGS | Xray Diffractometer, 2ea Available | |
Test | RIGAKU | Wafer X 300 | XRF Film Thickness& Composition Tool, FOUP Loading of 300mm Wafers | |
Test | Riken Medic | DBS-160S | Draft chamber of IPA cleaner | |
Test | Rudolph | Auto EL IV | Ellipsometer w/ Automatic R-06 StageMaximum wafer size 150mm | |
Test | Rudolph | FE-â…£/D | Ellipsometer | |
Test | Rudolph | FE-III | Focus Ellipsometer | |
Test | Rudolph | METAPULSE 200 |
| |
Test | Rudolph | Spectralaser 200XLS | Simultaneous multi angle, multi wavelength Ellipsometer w/ fully integrated UV Reflectometer | |
Test | Rudolph | Auto EL III | EllipsometerMaximum wafer size 150mm | |
Test | RUDOLPH RESEARCH | FE-III | Focused Beam Ellipsometer, for up to 200mm Wafers | |
Test | Rudolph Research | FE-IV |
| |
Test | Rudolph Research | FE-IV |
| |
Test | Rudolph Research | Metapulse 200 |
| |
Test | Rudolph Technologies | AutoEL III | Manual benchtop single wavelength ellipsometer up to 6" | |
Test | Rudolph Technologies | AutoEL IV | Manual benchtop multi wavelength ellipsometer up to 6" | |
Test | Rudolph Technologies | FE III | Automated- pattern rec-single wavelength ellipsometer up to 8" | |
Test | Rudolph Technologies | FE IV | Automated-pattern rec- single wavelength ellipsometer up to 8" | |
Test | Rudolph Technologies | FE VII | Automated- pattern rec- single wavelength ellipsometer up to 8" | |
Test | Rudolph Technologies | SpectraLASER 200 | Multi wavelength laser ellipsometer and full spectrum reflectometer | |
Test | RVSI | Vanguard VAi 6000 | BGA Solder Ball Placement System w/Vai 100 Loading System | |
Test | SAGAX | Isoscope 125 | Film Thickness Monitor | |
Test | SAGITTA | ECP-2000 | Cross Section Polisher | |
Test | Santa Clara Plastics (SCP) | E200 |
| |
Test | Santa Clara Plastics (SCP) | SCP | Wetsink for Descum | |
Test | Schlumberger | BLU2K |
| |
Test | Schlumberger | BLU300EI |
| |
Test | Schlumberger | BLU300EI |
| |
Test | Schlumberger | IDS 10000PLUS |
| |
Test | Schlumberger | IVS 100 | Automated Metrology System Wafer Sizes: 100 to 200mm | |
Test | Schlumberger | NA | Handler | |
Test | Scientific Instruments | 1LM21H |
| |
Test | SDI | FAaST 230 | Surface Photo Voltage Test System with COCOS | |
Test | SDI | FAaST 230-DP+SPV | Surface Photo Voltage Test System with COCOS & SILC | |
Test | SDI | FAaST 330 | Dielectric Charaterization Tool with COCOS, SILC & Epi-t for up to 300mm Wafers | |
Test | SDI | SPV 1020 | Surface Photo Voltage Tester | |
Test | SDI | SPV-300 | Surface Photo Voltage Tester for up to 300mm Wafers | |
Test | Seiko | CQDP-40 CLN |
| |
Test | Seiko Instruments Inc. | SMI 9800 | High Performance Scanning Ion Microscope | |
Test | SelA MC | 100 | Micro Cleavage System Capable up to 6" wafers | |
Test | SemiFab | CD-E1/750 |
| |
Test | SemiGas | 2 | Cylinder Cabinet with Purge Controller | |
Test | SemiTest | SCA2000 | Surface charge analyzer for real time C-V testing | |
Test | Semitest | SCA-2500 | Real time Surface Charge Analyzer | |
Test | SEMITOOL | 0870F-3-1-E-ML | Dual Rinser Dryer | |
Test | Semitool | Equinox | HF Vapor Cleaner | |
Test | Semitool | LT-312 |
| |
Test | Semitool | Magnum |
| |
Test | SEMITOOL | MILLENIUM300 | Wafer spin cleaner | |
Test | Semitool | MILLENNIUM |
| |
Test | Semitool | SAT 205ID | Spray Acid tool Accommodates 6" substrate | |
Test | Semitool | SAT 208 (2P) | Spray Acid Tool Accommodates 6" substrate | |
Test | Semitool | SAT 3061D | Spray Acid Tool Accommodates 6" substrate | |
Test | Semitool | ST-860D | Capable of 2" to 5" Wafers | |
Test | SEMITOOL | ST860F | Spin Rinser Dryer with PSC-101 Controllers, 2ea Available | |
Test | SEMITOOL | ST860F | Spin Rinser Dryer with PSC-102 Controllers | |
Test | SEMITOOL | ST-870D | Dual Stack Spin Rinse Dryer | |
Test | Semitool | VTP 1500 | Furnace | |
Test | Semitool | WST 306 | Wafer Soluble Develop/Strip Tool Capability of 100mm - 125mm wafer | |
Test | Semitool | WST 308 |
| |
Test | Semitool | WST 308 | Wafer Soluble Develop/Strip Tool Capability of 100mm - 125mm wafer | |
Test | SEMITOOL | WST305M |
| |
Test | Semitool | Semitherm VTP Anneal | Vertical Furnace | |
Test | Semix | Semix | SOG Tracks made by TOK non U line | |
Test | SEZ | 201 |
| |
Test | SEZ | RST 201 | Wet Etcher | |
Test | Shibaura | CDE80 | CDE80 | |
Test | Shinkawa | SFB200 | Flip Bonder 150mm | |
Test | SHINKO | BGA-BA-1 | BGA Mounting Tool | |
Test | SHINKO | BGA-BM-2 | BGA Alignment Tool | |
Test | Sloan | Dektak II | Precision Surface Profile Measuring SystemCapable up to 6" wafers | |
Test | Sloan | Dektak IIA | Surface Profile Measuring System | |
Test | Sloan | Veeco Dektak 3030 | Surface Profile Measuring SystemCapable up to 6" wafers | |
Test | Solitec | 8260-CB | Coat Vacuum Bake Track 2" to 5" Wafer Capacity. | |
Test | SOPRA | ES-4G | Spectroscopic Ellipsometer | |
Test | Speedfam/IPEC | 372 |
| |
Test | SpeedFam/IPEC | 676 - ILD |
| |
Test | SpeedFam/IPEC | Auriga - ILD |
| |
Test | SpeedFam/IPEC | CMP V - ILD |
| |
Test | SPEEDFAM/IPEC | AVANTI 372 | CMP SYSTEM | |
Test | SSEC | 2100 | Computer controlled Parallel Seam Sealer | |
Test | SSEC | 2300 | Precision Parallel Seam Sealer | |
Test | SSEC | 2300DLL4 | Precision Parallel Seam Sealer | |
Test | SSEC | 2300e | Parallel Seam Sealer with 2300 Mechanism, 60" Glove Box, 2ea Passthru Ovens, Moisture Monitor | |
Test | SSEC | Evergreen Model 50 | Wafer/Plate Cleaner with Automatic Loading, High Pressure and Brush Scrubbing | |
Test | SST | EKC | Metal Etch wet Sink | |
Test | ST5020 | Credence |
| |
Test | STAUBLI SA | Puma 200 | Robot, 2ea Available | |
Test | Steag | AWP |
| |
Test | Steag Microtech |
| Marangoni Dryer | |
Test | STI | LAM |
| |
Test | Strasbaugh | 6DS-SP | Rotational CMP Platforms | |
Test | Strasbaugh | 6EC | Rotational CMP Platforms | |
Test | Strasbaugh | 6DS-SP | Some parts missing integrated Ontrack post CMP cleaner | |
Test | StrataSys Inc | FDM 2000CAD |
| |
Test | STS | 320PC | Reactive Ion Etch System | |
Test | STS | Multiplex | RIE system | |
Test | STS | Multiplex | CVD Deposition for 100mm-200mm Wafers | |
Test | STS | Wet Process | Wet Process | |
Test | STS5000 | Credence | tester/SPARC 20 CPU/32 signal pins RF mix cards 2 | |
Test | Sumitomo | NKN 202 383A OSC | Hybrid etcher | |
Test | SVG | 8120 | Coater, Bake | |
Test | SVG | 8120 | Developer, Bake | |
Test | SVG | 90S | Coater, Developer, excellent condition, 200mm | |
Test | SVG | VTR-7000+ | Vertical Furnace | |
Test | SVG Thermco | VTR 7000 | Vertical Furnace | |
Test | SVG Thermco | VTR 7001 | Vertical Furnace | |
Test | Taitan | TAITAN | STEPPER | |
Test | TAKATORI | ATM-1100C | Wafer Taping Machine for up to 200mm Wafers | |
Test | Takatori | ATRM-2100 |
| |
Test | Takitori | ATM 1100C |
| |
Test | TAMARACK | PRX 500/1000 | UV Exposure System | |
Test | Technics | 500-II | Plasma SystemChamber 9"W x 6"H x 8"D | |
Test | Technos | TREX-610 | X-ray Analizer | |
Test | Technos | TREX 610S TXRF | TXRF Series X-Ray Wafer AnalyzerWafer Diameter: 100 mm to 200 mm | |
Test | TEGAL | 411 | Plasma Barrel Stripper | |
Test | Tegal | 801 | Inline Plasma etcher | |
Test | Tegal | 803 | Inline Plasma etcher | |
Test | TEGAL | 1511 | Plasma Etcher, Parts Only | |
Test | Tegal | 900E | Cass to Cass Wafer Photoresist stripper | |
Test | Tegal | 900E | Cass to Cass Strip backside etch | |
Test | Tegal | 901E | Cass to Cass Polysilicon/Silicon Nitride Plasma Etcher | |
Test | Tegal | 903E | Cass to Cass Single Wafer Plasma Etcher | |
Test | Tegal | 803 | Inline Automatic Plasma Etcher3" to 5" Wafer Capacity. | |
Test | Tegal | 903E | Plasma Etch System3" to 6" Wafer Capacity | |
Test | TEGAL | 903e | Plasma Metal Etch System | |
Test | TEL | 19S | Wafer Prober | |
Test | TEL | 19S | Wafer Prober | |
Test | TEL | 19S | Wafer Prober | |
Test | TEL | 19S | Wafer Prober | |
Test | TEL | 19S | Wafer Prober | |
Test | TEL | 19S | Wafer Prober | |
Test | TEL | 19S | Wafer Prober | |
Test | TEL | 19S | Wafer Prober | |
Test | TEL | 19S | Wafer Prober | |
Test | TEL | 580LC | Etch system Cassette to Cassette Handling 2" to 6" Wafer Capacity. | |
Test | TEL | 615 VDF | Furnace, Wet Oxide | |
Test | TEL | ACT 8 SOD |
| |
Test | TEL | ACT-8 | Dual block coat and develop track system | |
Test | TEL | ACT-8 | Dual block coat and develop track system | |
Test | TEL | Alph 805 | Furnace | |
Test | TEL | Alph 805 | Furnace | |
Test | TEL | Alph 805 | Furnace | |
Test | TEL | Alph 805 | Furnace | |
Test | TEL | Alph 805 | Furnace | |
Test | TEL | Alpha 605 | LPCVD Furnace | |
Test | TEL | Alpha 803 | LPCVD Furnace | |
Test | TEL | Alpha 803 | LPCVD Furnace | |
Test | TEL | Alpha 803 | LPCVD Furnace | |
Test | TEL | Alpha 803 | LPCVD Furnace | |
Test | TEL | Alpha 803 | LPCVD Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 803 | Furnace | |
Test | TEL | Alpha 808 | LPCVD Furnace | |
Test | TEL | Alpha 8S - Anneal |
| |
Test | TEL | Alpha 8S - Nitride |
| |
Test | TEL | Alpha 8S - Oxide |
| |
Test | TEL | Alpha 8S - Poly |
| |
Test | TEL | Alpha 8SE - Other |
| |
Test | TEL | Alpha 8SE - Other |
| |
Test | TEL | Alpha 8SE - Other |
| |
Test | TEL | Alpha 8SE - Other |
| |
Test | TEL | Alpha8SE |
| |
Test | TEL | Alpha-8SE-E | Small Footprint Oxidation Furnace for up to 200mm Wafers | |
Test | TEL | Clean Track Act 8 |
| |
Test | TEL | GX-2104 | Furnace | |
Test | TEL | IW-6C | LPCVD Furnace | |
Test | TEL | IW-6C | LPCVD Furnace | |
Test | TEL | IW-6C | LPCVD Furnace | |
Test | TEL | Mark II | 150mm, Developer | |
Test | TEL | Mark II | 150mm, developer | |
Test | TEL | Mark-8 | SOD Track System | |
Test | TEL | MB2-730 | Wsi CVD | |
Test | TEL | P8 | Prober with hot chuck | |
Test | TEL | P8 | Prober with hot chuck | |
Test | TEL | SCCM | Chamber Only for TEL Unity M Etch Tool - Excellent Condition | |
Test | TEL | TE 8500 ATC | Oxide Etcher ATC chamber | |
Test | TEL | UL 2604 08L | Furnace | |
Test | TEL | Unity II 88 | Etcher | |
Test | TEL | Unity Iie 88 DD | Oxide Etcher SSCM | |
Test | TEL | Unity SP |
| |
Test | TEL | VCF615 | LPCVD Furnace | |
Test | TEL | α-8S-ZABF | DIFFUSION FURNACE | |
Test | TEL・Varian | MB2-830 | Sputter | |
Test | TEL・Varian | MB2-830 | Sputter | |
Test | TELEDYNE | TAC PR-53 | Wafer Prober | |
Test | Temescal | BJD-1800 | Electron Beam Evaporator | |
Test | Temescal | FC-1800 | Load Locked E-Beam Evaporator, one refurbished | |
Test | TEMESCAL | FC-1800 | E-Beam Evaporator, with CV-14 P/S, 4 Pocket E-Gun, Substrate Heat, more | |
Test | Temescal | FC-4800 |
| |
Test | TEMESCAL | FCE-4000 | E-Beam Evaporator, with 3' X 3' X 3' Chamber, CV-14 P/S, 4 Pocket E-Gun, Ion Tech Ion Gun, PLC Controller, Inficon IC5 Deposition Controller, Substrate Heat, MFC Gas System | |
Test | TENCOR | AlphaStep 200 | Profilometer | |
Test | TENCOR | AlphaStep 200 | Profilometer | |
Test | TENCOR | ALPHA-STEP 200 |
| |
Test | TENCOR | Alpha-step P1 |
| |
Test | Tencor | FT600 | Prometrix FT-600 | |
Test | Tencor | P-10 | Surface Profiler Sample Size: up to 200 mm | |
Test | TENCOR | SFS 6220 | 1996, 200mm | |
Test | TENCOR | Surfscan 4000 | Unpatterned Wafer Surface Inspection Tool - Parts Tool Only | |
Test | TENCOR | Surfscan 4500 | Unpatterned Wafer Surface Inspection Tool | |
Test | Tencor | HRP 100 | High Resolution Profiler | |
Test | Tencor | P12 | Profiler | |
Test | Tepla | Auto 300 | Asher | |
Test | Teradyne | 5539Ci | AOI, Advanced Optical Inspection Panel Tester | |
Test | Teradyne | J973ST | Structural Test | |
Test | Teradyne | J994W |
| |
Test | Teradyne | J994W |
| |
Test | Tesam | 8653DC | Handlers | |
Test | Thermawave | 5240 | Film Thickness Measurement Tool | |
Test | Thermawave | Optiprobe 2600 | Film Thickness Measurement Tool | |
Test | Thermawave | Optiprobe 2600B |
| |
Test | ThermaWave | TM320 | Therma-Wave ThermaProbe TP320 | |
Test | Thermco | MB-71 | Laboratory Diffusion Furnace Operating Temperature 200c to 1200c | |
Test | Thermo Electron | ECO 8 |
| |
Test | TOKYO SEIMITSU | A-FP-210A | CMP | |
Test | Tokyo Seimitsu | A-PM-90A | Wafer Prober | |
Test | Tokyo Seimitsu | A-PM-90A | Wafer Prober | |
Test Assebley | Topcon | WM-1700 | Particle Measurement System | |
Thin Films | TRION | Minilock | Single Wafer RIE Etcher with Loadlock, 200mm Wafers | |
Thin Films | TSK | APM-90A | Automatic Wafer Prober, for up to 200mm Wafers | |
Thin Films | TSK | UF-200AL | Automatic Wafer Prober, for up to 200mm Wafers | |
Thin Films | UF200 | TSK |
| |
Thin Films | Ultrapointe | 1010 | Laser Imagin system | |
Thin Films | Ultratech | 1100 | 1:1 projection stepper | |
Wet | Ultratech | 22441 | I line stepper | |
Wet | Ultratech | 4700 2244i Titan | Wafer Stepper | |
Wet | Ultratech | 6700 Saturn | Wafer Stepper | |
Wet | Ultratech | 602 | Mask Cleaner Handles up to 7" x 7" Mask | |
Wet | Ulvac | UNA-2000 | Ashing System3" to 6" Wafer Capacity. | |
Wet | Unaxis | BAK 1131 | Large Box Coater Evaporation System | |
Wet | Unaxis | BAK EVO | 2001, Thermal Evaporator | |
Wet | Unit | See Listing | Unit Mass Flow Controllers | |
Wet | Unltratech | MLA |
| |
Wet | Ushio | TUV 604 | UV Bake | |
Wet | USHIO | UX-4040SC-CA01 | Mask Aligner | |
Wet | USHIO | Wee |
| |
Wet | USHIO | WEE, FX 500sk |
| |
Wet | UT1000 | TEL | Metal Etcher | |
Wet | V2 | KVD | Mixed signal, tester/DC source16 I/O channels/test head support up to 16 channels per card/80 I/o channels/Waveform source and measure | |
Wet | Vacuum Tech | Dry | etch processing systems | |
Wet | Varian | 3280 | Sputter | |
Wet | Varian | E220 |
| |
Wet | Varian | VFW287081 |
| |
Wet | VCR Group | D500i | Wafer Dicing Table Saw | |
Wet | Veeco | Dektak V320-SL |
| |
Wet | VEECO | DEKTAKSXM | Inspection | |
Wet | VEECO | SXM | Atomic Force Profiler | |
Wet | Versatest | V1004 |
| |
Wet | Versatest | V1004 |
| |
Wet | Verteq | 1600 | Dual Stack SRD | |
Wet | Verteq | 1600 SRD | Double StackCapable of 4" to 6" Wafers | |
Wet | VERTEQ | SPIN Dryer 1800-50B |
| |
Wet | Verteq | 1600 SRD | Single Stack Capable of 4" to 6" Wafers | |
Wet | Watkins Johnson | 1000T | APCVD Furnace | |
Wet | Watkins Johnson | WJ1000 | APCVD Tool | |
Wet | Watkins Johnson | WJ1000 | APCVD Tool | |
Wet | Watkins Johnson | WJ999 | APCVD Tool | |
Wet | Watkins Johnson | WJ-999R | APCVD Tool | |
Wet | Waypoint Technology Inc |
|
| |
Wet | WED | 8602 |
| |
Wet | WED | Loader AUL | AutoloaderCapable of 4" to 6" Wafers | |
Wet | WED | MarcoSpec UV Inspection | Inspection SystemCapable of 4" to 6" Wafers | |
Wet | WED | Micro Loaders | Inspection SystemCapable of 4" to 6" Wafers | |
Wet | WINTEST | 103C | Digital Tester | |
Wet | WJ1000TEOS | Watkins Johnson |
| |
Wet | WJ1500 | Watkins Johnson | APCVD | |
Wet | Wyko | BOP2000W | Bump Measurement Profiling system | |
Wet | XR80 | APPLIED MATERIALS | Implanter | |
Wet | Yield YES | R-3 | Plasma Cleaning System Chamber size: 16" W x 12" D x 7" H | |
Wet Etch | Yield YES | LPIII-M3 | Vapor Prime OvenChamber 12"x12"x13.25" | |
| Zeiss | Axiotron |
| |
| Zeiss | IM-12 | Wafer LoaderCapable of 4" to 6" Wafers | |
| Zygo | 8100 | Wavefront Analyzer Capable 3" to 8" wafers | |
|
| JED-2001 | X-ray Analizer | |
Please contact sales@bestinthefield.com to get a qoute for your project.